ionLINE is a novel ion beam lithography,
nanofabrication and engineering
workstation for low dose applications
in surface science,thin film engineering
and applied physics research.
Designed in an uncompromised nanolithography
system architecture, ionLiNE represents a new
instrument class for research and development.
ionLINE as dedicated ion beam nanolithography,
fabrication, and engineering instrument offers
unique opportunities for exciting research
results.
The patented Nano FIB TM ion optics provides
overnight beam current stability required for
advanced and automated patterning.
Low beam tails offer high selectivity.
For applications covering large areas, a laser
interferometer controlled stage is integrated.
Key applications
- Low dose ion events
- Thin film engineering
- Surface functionalisation
- Localised defect injection
For advanced nanoengineering, ionLiNE
can be configured with nanomanipulators
and a gas injection system.
| Benefit |
Feature |
| Automated ion beam fabrication
capabilities |
Designed in nanolithography tool
architecture |
| Superior beam current and beam position
stability |
Patented NanoFIB column concept non tilted
laser interferometer stage |
| High lateral selectivity of ion beam |
Specialised ion optics design |
| Low dose application regime |
High speed 16 bit pattern generator with
nanosecond ion dose control |
| Patterning and blind navigation on large
areas |
Closed loop laser interferometer stage
control and top view optical microscope |
| Guaranteed nanofabrication
performance |
Integrated ion optics, patterning,
nanofabrication and engineering software suite |
| Ease and reliability of operation |
Multi user management and one integrated
software platform |
|
e_LINE is a ultra high resolution
electron beam lithography system and
nanoengineering workstation for
universities and other academic
institutions.
Selected options for nanomanipulation, EBID
and EBIE expand this system to a versatile
nano-engineering workstation.
The state-of-the-art e_LiNE electron column
matches perfectly with a number of key
applications in CNT research, thin film
engineering, photonic crystals and EBID.
Key applications
- Lithography on 4 inch samples
- EBID and EBIE
- In-situ electrical measurements and
nanomanipulation, e.g. CNT or nanorods
Basic hardware features
- Thermal assisted field emission gun
- Cross-over free column with highest beam
current density at 2 nm spot size
- Laser interferometer stage with 100 mm by
100 mm travel range and 2 nm resolution
achieved by closed-loop piezo-positioning.
- 10 MHZ DSP-controlled digital pattern
generator.
- Optional gas injection system,
nanomanipulators, EDX, optical microscope,
loadlock, rotation and tilt module, FBMS
mode exposure
Homepage : http://www.raith.com
|
ELPHY Plus is a high end advanced
lithography package for your SEM or FIB,
and is typically chosen for use for
Field Emission SEM or FIB with
electrostatic deflection.
The high speed ELPHY Plus hardware
architecture offers lowest noise, best signal
quality and stability even at high writing
speeds.
No PC based approach can match the performance
of the ELPHY Plus hardware.
Raith's world wide support infrastructure for
installation and training at your site
warrants that you will able to pattern and
inspect results within the shortest possible
time.
ELPHY software features
- Hierarchical fully integrated GDSII layout
editor/viewer
- Data import for DXF, CIF and ASCII data
- Exposure parameter adjustment and
calculation
- Macro generation and VB scripting
- Digital image acquisition
- Line width measurement capabilities
- SEM/FIB remote control and FIB module
- A second offline licence is included
- Optional: Fully integrated proximity effect
correction and parameter calculation
ELPHY Plus hardware features
- 6 MHz high-speed pattern generation hardware
(19inch DSP Unit decoupled from PC)
- Fast, noise-reduced, deglitched and high
performance 16 bit DAC vector scan beam
deflection
- 16 bit DAC vector scan beam deflection
- 2 ns writing speed resolution
- TTL and 100 V blanking signal drivers
- 12 bit AD channel for reading detector
signal (image acquisition)
- TTL signal for FIB/SEM external beam
control request
- 3 additional DAC per channel for alignment
and calibration (hardware for scaling,
rotation / orthogonality and shift)
- Decoupling from PC electronics and thermo
control for main and calibration DACs
|
ELPHY Quantum is the most widespread and
universal lithography attachment for
SEM & FIB.
All required functions are fully integrated
into one software, from pattern design,
exposure parameter management, pattern overlay
alignment to step and repeat exposures.
ELPHY Quantum hardware is a specifically
designed 16bit, 2.5 MHz DAC vector scan beam
deflection PC board installed into a state of
the art Windows computer.
Raith´s world wide support infrastructure for
installation and training at your site warrants
that you will able to pattern and inspect
results within the shortest possible time.
ELPHY software features
- Hierarchical fully integrated GDSII layout
editor/viewer
- Data import for DXF, CIF and ASCII data
- Exposure parameter adjustment and
calculation
- Macro generation and VB scripting
- Digital image acquisition
- Line width measurement capabilities
- SEM/FIB remote control and FIB module
- A second offline licence is included
- Optional: Fully integrated proximity
effect correction and parameter calculation
ELPHY Quantum hardware features
- TTL - blanking signal output
- TTL - SEM/FIB external scan enable/disable
- TTL signal for FIB/SEM external beam
control request
- 3 additional DAC per channel alignment and
calibration (hardware for scaling,
rotation / orthogonality and shift)
Homepage : http://www.raith.com
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